Firstly the poly(dimethylsiloxane) (PDMS) elastomeric stamp used in soft lithography was fabricated by the photolithography technique.

本文还用微印刷技术证实了聚电解质多层膜的可压缩性。

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Processes of SU-8 photoresist mold and polymer elastomeric stamp were researched in order to solve the technology of the key part—elastomeric stamp in the soft-lithography.

为了解决软光刻技术中核心元件弹性印章的制备技术，对SU-8胶印模和聚合物弹性印章进行了工艺研究。

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As a newly coming micro fabrication technology, soft lithography use elastomeric stamp to replace hard stamp in traditional lithography to fabricate micro patterns and structures.

作为一种新型的微图形复制技术，软光刻技术用弹性模替代传统光刻技术中使用的硬模来产生微形状和微结构。

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